(4 quotes found)
“Cleaning of defects is a critical and necessary step in generating a zero-defect mask blank, because defects in the substrate become defects in the multilayer, which ruins the mask blank.”
David Krick
“A great deal of work still remains for getting EUV mask blanks ready for manufacturing, but our cleaning methodology has removed another barrier. We are well positioned for the tasks ahead.”
“This achievement is a critical and necessary step in generating a zero-defect mask blank.”
“This achievement is a critical and necessary step in generating a zero-defect mask blank. It demonstrates that the MBDC now has world-class cleaning capability in addition to our world-class deposition expertise.”
